Atomic Layer Deposition (ALD) Experts

Scientific assignment

Contribute atomic layer deposition and thin-film process expertise to an AI research program focused on semiconductors and the physical sciences. The work converts process knowledge, precursor chemistry, characterization results, and troubleshooting judgment into reliable training and evaluation data.

Core responsibilities

• Contribute expertise in ALD process development, precursor chemistry, and thin-film characterization.
• Review AI-generated scientific reasoning for technical errors and incomplete treatment of process constraints.
• Design and solve demanding problems in ALD and semiconductor processing.
• Rate and rank model outputs against stated scientific criteria, with precise written reasoning.
• Organize process parameters, recipes, and characterization results into consistent, model-ready formats.
• Deliver accurate work within defined timelines.

Relevant expertise

Candidates should have hands-on experience developing, optimizing, or troubleshooting ALD processes. Deep knowledge of thin-film deposition for semiconductor or advanced-packaging applications is expected, together with a strong understanding of precursor chemistry and surface-reaction mechanisms. Relevant characterization methods include XRD, SEM, TEM, XPS, and ellipsometry. An MS, PhD, or equivalent practical experience in materials science, chemistry, chemical engineering, or physics is expected, along with clear written English and the ability to explain technical reasoning precisely.

Engagement details

• Remote work based in the United States.
• Long-term, ongoing engagement.
• Up to 40 hours per week, with a minimum commitment of 10 hours.